Sputtering Target
Sputtering Targets are used in the PVD-coating process to achieve thin film coatings. FAST Metallurgy can provide a wide range of sputtering targets in various sizes and material compositions. FAST Metallurgy produces most of the sputtering targets in Germany and therefore can provide different material compositions in a very short delivery time. Any material alloy, mixture, pure metal, oxide, nitride, boride, carbide can be supplied as a sputter target. If you cannot find your desired sputter target on the product page, don’t hesitate to ask us.